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titanium sputtering target

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MOQ : 10 Tons

titanium sputtering target Specification

Other Material
Available on request (e.g., Ti-Al, TiN)

Product Type
Titanium Sputtering Target

Material
Titanium

Type
Seamless

Shape
Square

Standard
ASTM B265, ASTM F67, ISO 9001:2015

Technique
Hot pressing, Vacuum melting

Surface Treatment
Polished / Mirror Finish

Diameter
50 mm to 300 mm (customized sizes available)

Length
up to 360 mm

Wall Thickness
3 mm to 25 mm (customizable)

Grade
Grade 1, 2, 5 (ASTM B348, B265)

Density
4.51 Gram per cubic centimeter(g/cm3)

Color
Metallic Silver-Grey

Compressive Strength
620 MPa

Application
PVD, CVD, Semiconductor, Optical coatings

MOQ
1 piece

Hardness
160 HV (Vickers)

Electrical Resistivity
42.7 nm

Thermal Conductivity
21.9 W/mK

Packaging
Vacuum sealed with foam protection

Purity
99.5% Ti

Melting Point
1668C

titanium sputtering target Trade Information

Minimum Order Quantity
10 Tons

FOB Port
shanghai

Supply Ability
100 Tons Per Month

Delivery Time
20 Days

Sample Available
Yes

Sample Policy
Within a certain price range free samples are available

Main Export Market(s)
Asia, Australia, Central America, North America, South America, Eastern Europe, Western Europe, Middle East, Africa

Main Domestic Market
All India

Certifications
iso 9001-2008

About titanium sputtering target

Specifications

titanium target
standard: ASTM B348, ASTM F67, ASTM F136
Material: Gr1, Gr2,Gr3,Gr4,Gr5,Gr7,Gr12 etc

Titanium target, titanium bar, titanium rod,GR2 titanium target

standard: ASTM B348, ASTM F67, ASTM F136
Material: Gr1, Gr2,Gr3,Gr4,Gr5,Gr7,Gr12 etc

OD: 10~200mm

Packing:wooden cases.

technics: hot rolled

condition:M/Y

payment: T/T

Delivery time: 7-15days

Versatile Material Excellence

Titanium sputtering targets deliver unmatched performance in demanding environments due to their high purity, seamless construction, and adherence to global quality standards. Offering exceptional hardness, conductivity, and strength, these targets are ideal for semiconductor, optical, and advanced coating industries seeking reliable consistency.

Custom Sizes and Advanced Surface Finishes

We provide titanium sputtering targets in a variety of dimensions, including diameters from 50 mm to 300 mm and lengths up to 360 mm, with wall thickness customizable between 3 mm and 25 mm. Each target receives a polished or mirror finish for optimal thin film deposition and minimal contamination.

Secure Packaging and Reliable Delivery

Every titanium sputtering target is vacuum-sealed with foam protection to ensure integrity during transit. As an established Indian exporter and supplier, we cater to international and domestic clientele, ensuring prompt delivery and tailored packaging for maximum product safety.

FAQ's of titanium sputtering target:

Q: How do I determine the right titanium sputtering target size and thickness for my coating application?

A: You should consider your system requirements, such as chamber size, deposition area, and desired coating thickness. Our products are available in customizable diameters (50-300 mm), lengths (up to 360 mm), and wall thicknesses (3-25 mm) to suit various PVD and CVD processes.

Q: Where are these titanium sputtering targets typically used?

A: These targets are primarily used in semiconductor fabrication, optical coatings, and thin film applications through PVD and CVD methods. Industries such as electronics manufacturing, solar panels, and precision optics benefit from their high purity and mechanical strength.

Q: What is the manufacturing process for your titanium sputtering targets?

A: The targets are manufactured using hot pressing and vacuum melting techniques, ensuring a seamless construction. These methods contribute to high density and uniform microstructure, finished with a polished or mirror-like surface for optimal performance.

Q: When should I consider choosing a customized titanium alloy target, such as Ti-Al or TiN?

A: You may require a customized alloy target when your application demands specific material properties, such as improved wear resistance, electrical characteristics, or compatibility with unique substrate materials. We provide tailored compositions upon request to match your requirements.

Q: How are titanium sputtering targets packaged for shipping?

A: Each target is vacuum-sealed with protective foam to prevent contamination and physical damage during transit. This ensures the target arrives in pristine condition, ready for immediate use in cleanroom or high-precision environments.

Q: What benefits do titanium sputtering targets with a 99.5% purity level provide?

A: High-purity titanium targets minimize contamination in thin film deposition, endorse excellent film adhesion, and improve coating uniformity-crucial in sensitive semiconductor and optical applications. The 99.5% purity ensures reliability for demanding, high-performance coatings.

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