gr1 titanium sputtering target

Name: gr1 titanium sputtering target
Brand: BAOJI HONG YA DA NONFERROUS METAL MATERIALS CO., LTD.
Price: 13.0 USD
Availability: InStock

Price 13.0 USD ($)/ Piece

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MOQ : 1 Piece

gr1 titanium sputtering target Specification

Material
Titanium

Type
Seamless

Shape
Square

gr1 titanium sputtering target Trade Information

Minimum Order Quantity
1 Piece

FOB Port
shanghai

Supply Ability
100 Pieces Per Month

Delivery Time
20 Days

Sample Available
No

Sample Policy
Free samples are available

Packaging Details
wooden case

Main Export Market(s)
Asia, Australia, Central America, North America, South America, Eastern Europe, Western Europe, Middle East, Africa

Main Domestic Market
All India

Certifications
iso 9001-2008

About gr1 titanium sputtering target

Specifications

titanium target
standard: ASTM B348, ASTM F67, ASTM F136
Material: Gr1, Gr2,Gr3,Gr4,Gr5,Gr7,Gr12 etc

Titanium target, titanium bar, titanium rod,GR2 titanium target

standard: ASTM B348, ASTM F67, ASTM F136
Material: Gr1, Gr2,Gr3,Gr4,Gr5,Gr7,Gr12 etc

OD: 10~200mm

Packing:wooden cases.

technics: hot rolled

condition:M/Y

payment: T/T

Delivery time: 7-15days

Superior Chemical Purity and Performance

Manufactured from 99.9% pure titanium, our Gr1 targets ensure high chemical purity for consistent results in critical applications. The seamless bars and squares maximize deposition efficiency, making them ideal for demanding industries requiring reliable and uniform thin films.

Precision Manufacturing in China

We operate as a leading distributor, exporter, supplier, and manufacturer of titanium sputtering targets in China. Our stringent quality controls ensure that each product meets international standards, making us a preferred partner globally.

FAQ's of gr1 titanium sputtering target:

Q: How is a Gr1 titanium sputtering target manufactured?

A: The Gr1 titanium sputtering targets are produced using high-purity titanium, shaped either into seamless bars or squares. Advanced melting and forming techniques maintain the chemical composition at 99.9% titanium and ensure structural uniformity essential for sputtering processes.

Q: What are the primary applications of these titanium targets?

A: These targets are extensively used in physical vapor deposition (PVD) to create thin films on semiconductor, optical, and solar devices, owing to their high purity, strength, and stable composition.

Q: When should I use a seamless bar or square-shaped sputtering target?

A: Seamless bar or square-shaped targets are typically chosen when uniform film thickness and high deposition rates are required, supporting specialized coating requirements in electronics and advanced material manufacturing.

Q: Where can these Gr1 titanium sputtering targets be sourced?

A: Our titanium sputtering targets are manufactured and distributed directly from China, serving both domestic and international clients through our extensive export and supply network.

Q: What is the benefit of using grade 1 titanium for sputtering targets?

A: Grade 1 titanium offers excellent corrosion resistance, high strength (458 MPa), and outstanding ductility, ensuring longevity and optimal performance in demanding sputtering environments.

Q: Can these targets be customized for specific requirements?

A: Yes, we can accommodate custom specifications for size, shape, and chemical composition to match particular deposition system needs, ensuring tailored solutions for every client.

Q: What is the typical process for ordering these products?

A: Clients can place orders by contacting us directly with their requirements. Orders are processed efficiently, and products are shipped from China with comprehensive quality documentation and support.

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